期刊文献+

优化的基于模型的光学邻近矫正算法

Optimization Algorithm for Model-Based Optical Proximity Correction 
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摘要 提出了一种新的优化的基于模型的光学邻近矫正算法,该算法充分考虑了图形内部及图形之间的光学邻近影响,实现了线段切割和移动步长的自适应性,提高了系统的矫正精度及矫正速度,实验结果表明该算法是有效的. The optimization algorithm considering the surrounding feature influences is presented.The algorithm implements the single loop optimization for the target feature and the dual loop optimization between the target features and the surrounding features by using the self adaptive step cutting and moving strategy.The experiments show that this algorithm can achieve much improvement in correction precision and efficiency.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第3期601-605,共5页 半导体学报(英文版)
基金 国家自然科学基金资助项目(批准号:90307017)~~
关键词 光刻 光学邻近效应 基于模型的光学邻近矫正 optical lithography OPE model-based OPC
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参考文献9

  • 1陈志锦,史峥,王国雄,付萍,严晓浪.一种快速光刻模拟中二维成像轮廓提取的新方法[J].Journal of Semiconductors,2002,23(7):766-771. 被引量:12
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二级参考文献12

  • 1[1]Chen J F,Laidig T,Wampler K E,et al.Practical method forfull-chip optical proximity correction.SPIE,1997,3051:790
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