轨道分子屏极高真空实验室设计技术研究

Design about Extreme High Vacuum Molecular Shield Lab.on Low-earth Orbit

给出了一种新型的近地轨道极高真空分子屏实验室设计。作者计算了可变翼分子屏周围大气分子的入射及散射、分子屏材料放气在屏内的分子数流密度。通过调整分子屏的翼角,分子屏内的压力可以达到10-12Pa。计算结果指出:在近地轨道选择合适的分子屏参数,可以在极高真空环境下加工超纯材料。

A new extreme high vacuum molecular shield lab. On low-earth orbit is designed. Using molecular shield technique with changeable wing, author calculated molecular number Current density that come from injection and scattering of atmosphere and outgassing from molecular shield materials. By adjusting the changeable wing angle of molecular shield, the pressure in molecular shield can be arrived 10-12Pa. It is shown selecting suitable parameters of molecular shield on low-earth orbit, we can process super pure materials in extreme high vacuum.