摘要
物理气相沉积(PVD)在表面处理技术中占有举足轻重的地位。本文通过对三类物理气相沉积技术原理的阐述,说明其应用现况及发展前景。
The physical vapor deposition always plays an important role in the surface treatment technology.The article illuminates its application and development by describing the theory of three kinds of physical vapor depositions.
出处
《皖西学院学报》
2005年第2期45-46,共2页
Journal of West Anhui University
关键词
物理气相沉积
真空蒸镀
阴极溅射
离子镀
physical vapor deposition
vacuum evaporation
cathode spatter
ion plating