码盘、圆光栅真空镀铬工艺的研究

Vacuum plating Cr technics on code disc and radial grating

通过对码盘、圆光栅真空镀铬原理及膜层形成机理的分析,给出膜层厚度和影响其均匀性和致密性的主要因素之间的关系式以及安全成膜时被镀件的临界转速,为真空条件下获得厚度均匀、致密性好的铬膜提供了理论依据。

In the paper,the relations between uniformity and compactness of film thickness and the factors affecting the uniformity and compactness of film thickness are given. The critical rotating speed of vacuum plating Cr under the condition of ensuring plating Cr reliably is educed by analyzing the vacuum plating Cr theory of code disc and radial grating and the film forming mechanism. A theoretical basis is provided for abtaining uniform and compact Cr film on plating pieces under vacuum condition.