新合成光固化牙釉质粘接剂粘接界面的扫描电镜

Electron Microscopic Study of Interface Connected by a New Light-Cured Enamel Adhesive

目的 观察初步合成的新合成单组分光固化牙釉质粘接剂引物及糊剂与牙釉质粘接界面的超微结构特点。方法 以粘接剂及符合实验要求的6颗离体双尖牙制备试样,通过扫描电镜观察并分析粘接剂自身结构以及粘接剂-牙釉质界面的超微结构。结果 (1)引物对牙釉质的渗透较好,与牙釉质表面形成比较光滑的混合层;(2 )粘接剂渗透入牙釉质形成的树脂突数量较多但长短不一。结论 在离体环境下的初步实验结果显示,本材料在牙釉质内树脂突渗透良好,但渗透深度不规则。

Objective To investigate the ultra-microstru ct ure of a new light-cured enamel adhesive,and also the characteristics of inter face between adhesive and enamel.Methods Prepared specimens were examined by a scanning el ectron microscopy (S2360N,HITACHI,Japan). Results The ultra-microstructural examination illustrate d that many resin tags formed at interface and infiltrated into etched enamel,bu t the infiltration depth was not regular. Conclusion The adhesive resin tags of interface were well -infiltrated into the enamel with irregular infiltration depth.