利用磁力显微镜研究倾斜溅射对TbFe薄膜磁性能的影响

Study on the effect of oblique sputtering on TbFe thin films by MFM

磁力显微镜(MFM)作为研究表面磁结构的有力工具已广泛应用于磁性薄膜的研究。TbFe磁致伸缩薄膜在实际应用中要求易磁化轴平行于膜面,以获得较低的面内饱和场Hs。传统的成膜技术难以实现这一目标,采用倾斜溅射方法制备TbFe薄膜可有效降低面内饱和场Hs。通过测量样品的磁滞回线可以发现,易磁化轴随着溅射角度的增加逐渐偏离样品的法线方向,而取向于平行膜面。本研究工作利用MFM研究了不同溅射角度得到的TbFe薄膜的磁畴结构。发现薄膜的磁畴结构随着溅射角度的增加逐渐由垂直畴转化为水平畴,与磁滞回线测量得到的易磁化轴方向发生偏转的结果相吻合。

Magnetic force microscopy(MFM) is a powerful technique in the research of the surface domains and used to study the soft magnetic sample. TbFe thin film is magnetostrictive, and has been widely used. To fulfill the practical requirement, its easy-axis of magnetization should be parallel to the film surface to reduce the in-plane saturation field H_S. The oblique sputtering technology has been applied in fabrication of TbFe thin film to reduce the H_S. The magnetic hysteresis loop of obliquely deposited TbFe films was measured,and shows that, with the increasing of the deposition angle, the easy-axis of magnetization was deflected rather than being vertical to the film. Magnetic domains of the TbFe films with different deposition angles were studied by magnetic force microscopy. The results indicate that the easy direction of magnetization was changed from out-of-plane to in-plane by obliquely deposition. It is consistent with the result that the easy-axis of magnetization would switch, measured by means of magnetic hysteresis loop.