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低温烧结远红外搪瓷的研制

Development of Far Infrared Enamel Fired at Low Temperature
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摘要 由锑钼基釉和石英粉组成的底釉以及由锑钼基釉、石英粉和矿物色素组成的面釉均可在800℃左右的较低温度下烧成。得到的搪瓷在室温时的全辐射率和在400℃时的远红外辐射率均大于0.90。低温烧结远红外搪瓷已作为红外加热器件的远红外辐射源在工业中得到了应用. A far infrared enamel,its ground coat composed of 100 wt% frit and 15 wt% quartz powder and cover coat composed of 70 wt% frit,30 wt%minerat pigment powder and 15 wt% quartz powder,can he fired at temperature as low as 800℃.The far infrared emissvity of enameT in the wave range of 1 —14μm at 400℃ is higher than 0.90.This far infrared enamel with low firing temperature has been used as a emissive source of the far infrared heating component in industry.
出处 《中国搪瓷》 1994年第5期14-17,共4页

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