摘要
采用固体粉末包埋渗硅工艺在铌表面制备了二硅化铌涂层,研究了渗硅过程中Si沉积的反应机理和二硅化铌涂层的结构.结果表明:涂层由单相的二硅化铌组成;Si的输运和沉积主要依靠硅的低氟化物SiF2完成.
NbSi2 coating was formed on niobium by halide-activated pack cementation process. The microstructure of the as-formed coating and the possible reactions of Si deposition were investigated. The results indicate that the as-formed coating consists of single phase of NbSi2. SiF2 is responsible for the transportation and deposition of Si in the pack.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2005年第3期764-768,共5页
Journal of Inorganic Materials
关键词
渗硅
涂层
铌
二硅化铌
Chemical vapor deposition
Coatings
Metals
Microstructure
Morphology
Oxidation resistance
Scanning electron microscopy
Silicon compounds
Thermodynamics
X ray diffraction analysis
