摘要
研究了工艺参数对全息涂料涂布均匀性的影响规律,给出了涂膜光学密度变化的数学表达式,以及定量评价涂布不均匀度的方法,为涂布工艺参数的优化设计,提供了理论依据。
The rule of which process parameter influences coating uniformity of holographic coating was studied. Optical density change of coating film and the method for evaluating coating non-uniformity quantitatively were given, which supply theoretic evidence for optimization design of holographic coating process parameter.
出处
《包装工程》
CAS
CSCD
北大核心
2005年第3期45-47,共3页
Packaging Engineering
基金
国家"九五"技术创新项目
国经贸技术[2000] (609)
关键词
全息涂料
涂布
均匀性
光学密度
Holographic coating
Coating
Uniformity
Optical density
