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基于自对准和空气桥工艺的SiGe HBT研究 被引量:1

Study of the SiGe HBT based on the self-alignment and air-bridge
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摘要 采用基区及发射区自对准和空气桥技术,降低了SiGe异质结晶体管器件的基极电阻及集电极和基极之间的结电容,提高了SiGe异质结晶体管器件的最高振荡频率fmax.以分子束外延SiGe材料为基础,研制出了SiGe异质结晶体管器件,取得了fmax为124.2GHz的结果. By using base-emitter self-alignment and air-bridge technology, the base resistance of SiGe heterojunction bipolar transistors(HBT) together with the capacitance between collector and base is reduced; in addition, the maximum oscillation frequency (fmax) is improved. In this paper, SiGe HBT fmax of 124.2 GHz has been obtained based on MBE SiGe materials.
出处 《西安电子科技大学学报》 EI CAS CSCD 北大核心 2005年第3期432-434,488,共4页 Journal of Xidian University
基金 国家部委预研支持项目(99JS09.2.2.DZ3401)
关键词 自对准 最高振荡频率 SiGe合金材料 Alignment Alloys Frequencies Oscillations
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参考文献9

  • 1Asbeck P M. Bipolar Transistors in High-Speed Semiconductor Devices[M]. New York: Jwiley, 1990.
  • 2林大松,张鹤鸣,戴显英,孙建诚,何林.SiGe HBT基区渡越时间模型[J].西安电子科技大学学报,2001,28(4):456-461. 被引量:11
  • 3Gruhle A, Kibbel H, K(o)nig U, et al. MBE Grown Si/SiGe HBTs with High β, fT, fmax[J]. EDL, 1992, 13(4): 206-208.
  • 4Kroemer, H. HBTs and Integrated Circuits[J]. Proc IEEE, 1982, 70(1): 13-25.
  • 5Tien P K. Propagation Delay in High Speed Silicon Bipolar and GaAs HBT Digital Circuit[J]. Int J High Speed Electr, 1990, 1(1): 101-124.
  • 6Schreiber H. High-Speed Double Mesa Si/SiGe HBT Fabricated by Self-alignment Technology[J]. Electr Lett, 1992, 28(12): 485-487.
  • 7Li Kaicheng, Sun Weifeng, Wang Qingping, et al. Reactive Ion Etching of Si1-xGex Alloy with Hydrogen Bromide[A]. Proceedings of 1998 5th International Conference on Solid-state and Integrated Circuit Technology[C]. Beijing: Publishing House of Electronics Industry, 1998. 729-795.
  • 8Li Kaicheng, Liu Daoguang, Zhang Jing, et al. Development on SiGe/Si Film Heterojunction Bipolar Transistors[A]. The 1998 4th International Conference on Thin Film Physics and Applications[C]. Shanghai: SPIE, 1998. 233-235.
  • 9Li Kaicheng, Liu Daoguang, Zhang Jing, et al. MBE-Based SiGe/Si Heterojunction Multilayer Structure[A]. Proceedings of 11th International Conference on MBE[C]. Beijing: Publishing House of Electronic Industry, 2000. 165-166.

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