铝基SiOx膜层滑动磨损及其机理研究

Wear and Morphologies of the SiOx Film on Aluminum Substrate

本文采用低温常压CVD方法制备铝基SiOx陶瓷膜层。以黄铜为对磨材料 ,使用销 -盘式磨损试验机对比研究纯铝表面与SiOx膜层的滑动磨损性能 ,通过SEM分析磨损的表面形貌并分析其磨损机理。结果表明纯铝表面发生粘着磨损 ,存在大量塑性变形和折叠 ,导致片状脱落 ,磨损率高 ;SiOx薄膜硬度较高 ,存在孔隙 ,表面发生塑性变形、崩塌和磨粒磨损 ;因薄膜孔隙具有储存润滑剂 (水 )的作用 ,磨损率明显低于对比纯铝样品 ;随沉积时间增加 ,SiOx膜层变厚 ,承载能力提高 ,磨损量减小。

SiOx thin film on aluminum substrate were prepared by Ambient Pressure Chemical Vapor Deposition(APCVD). The slide wear properties of the pure aluminum and SiOx film were studied by the antitheses in this report. The wear mechanism analysis and SEM morphologies demonstrated that the aluminum was inclined to wear by sticking friction. There are many plastic deformation and enfolded districts on the weared surface, which leads to the fact that the slice come off from pure aluminium surface and the wearing rate is high. The SiOx film is relatively high in hardness and some pores can be find by SEM. The collapsing zone could be observed in the SiOx film by SEM and the film was inclinged to wear by grain-abrasion. The abrasion rate of the SiOx film was also lower than the aluminum due to the interspaces were filled with water worked as the lubricant. With the prolonging of depositional time, the SiOx particles becamed larger and the wear loss reduced.