摘要
综述了三价铬镀铬研究的近期发展 ,并对Alecra 3工艺、DMF工艺、次磷酸盐体系、Cl- +SO42 - 体系工艺及各种非晶态代铬镀层进行比较 ;同时也对用直流和脉冲两种电源获得的镀层性能进行比较 ;探讨了三价铬镀铬层不能增厚的原因。
The recent advancement of trivalent chromium plating is reviewed, and a comparison among Alecra-3, DMF, H 2PO - 2 and Cl -+SO 4 2- plating systems is made. The coatings from DC and pulse power supplies are also compared. The reason why the coating thickness can not be raised is discussed.
出处
《电镀与环保》
CAS
CSCD
2005年第1期1-4,共4页
Electroplating & Pollution Control
关键词
电镀
三价铬
非晶态
镀铬
electroplating
trivalent chromium
amorphous
chromium plating
