摘要
研究了在氢化锆(H/Zr原子比为l.801)表面通过电镀铬制备氢渗透阻挡层的工艺。结果显示,基体表面经过适当氧化处理后电镀所得铬镀层与基体的结合强度和阻氢性能都有一定的提高;随着电流密度的升高,氢渗透阻挡层孔隙、显微裂纹明显增多;反之,氢渗透阻挡层连续致密。
<Abstrcat>The technology to prepare hydrogen permeation barrier with electrodeposited chromium on zirconium hydride (ratio of H and Zr is 1.801)was investigated. Results showed that with proper oxidizing pretreatment,the bond strength of Cr coating and substrate and the properties of hydrogen permeation barrier were improved. When current density increase, pores micro cracks in the barrier were increased obviously, and conversely, the barrier was continuous and dense.
出处
《材料开发与应用》
CAS
2005年第3期25-27,共3页
Development and Application of Materials
关键词
氢化锆
电镀铬
氢渗透阻挡层
Zirconium hydride
Electrodeposited chromium
Hydrogen permeation barrier
