Ni-P化学镀层的结构及晶化过程的研究

Structure and Crystallization of Chemical Plating Ni-P

本文采用x射线衍射仪、H-800透射电镜、差热分析仪及扫描电镜等手段,研究了含磷量为7.3％的Ni-P化学镀层的结构及晶化过程。结果表明:其镀后结构为非晶态,并首次用电子衍射花样说明其结构符合二维小片无规则错动堆垛的DDG模型;在加热过程中于150℃开始缓慢地放热,并在342℃产生强烈的放热反应,分别对应于低磷区少量镍的析出和Ni及Ni_3P稳定相的大量生成,其晶化过程以反Ostwald规则进行。温度超过600℃进入晶粒长大阶段,于752℃形成第二个放热峰。

This paper conducts studies on the structure and crystallization process of the chemical plating Ni-P, whose phosphorus content is 7.3%. A X-ray diffractometer, an H-800 transmission electron microscope, a differential thermal analyzer and a scanning electron microscope are used in the research. It is shown that the structure after plating is non-crystalline, agreeable to DDG model.