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Configuration of 2D Finite Clusters in Plasma Sheath 被引量:1

Configuration of 2D Finite Clusters in Plasma Sheath
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摘要 Finite clusters with a small number of charged particles immersed in a plasma environment have been numerically simulated with a dynamic method. Finite Coulomb clusters are systems of a small number of charged particles, N = 1 to 100, confined by a potential produced by plasma 2D-sheath. Under the action of net force each particle is in an equilibrium position and together they form finite Coulomb clusters. The results of our study show the configuration of Coulomb clusters do not depend on their initial state. After theoretically studied and tested by using the Monte Carlo technique we also prove the system energy is the determinant parameter of the configuration. In addition, the effect of the external magnetic field on the cluster configuration is analyzed. Finite clusters with a small number of charged particles immersed in a plasma environment have been numerically simulated with a dynamic method. Finite Coulomb clusters are systems of a small number of charged particles, N = 1 to 100, confined by a potential produced by plasma 2D-sheath. Under the action of net force each particle is in an equilibrium position and together they form finite Coulomb clusters. The results of our study show the configuration of Coulomb clusters do not depend on their initial state. After theoretically studied and tested by using the Monte Carlo technique we also prove the system energy is the determinant parameter of the configuration. In addition, the effect of the external magnetic field on the cluster configuration is analyzed.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2005年第3期2849-2850,共2页 等离子体科学和技术(英文版)
基金 The project supported by the National Natural Science Foundation of China (Nos. 10175013, 19875007)the International Collaboration Fund (Nos. 10010760807, 10160420799)
关键词 plasma crystals CLUSTER plasma crystals, cluster
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  • 4DUAN PING, WANG ZHENG XIONG, LIU YUE, et al. Dust charging in electronegative SiH4 plasmas [ J ]. Chinese Physics Letter, 2005, 22(2):405-408.
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  • 7NORIYOSHI SATO, GIICHIRO UCHIDA, TOSHIRO KANEKO, et al. Dynamics of fine particles in magnet- ized plasmas [ J ]. Physics of Plasmas, 2001, 8 ( 5 ) : 1786-1790.
  • 8XIU ZOU, JIN YUAN LIU, YE GONG, et al. Plasma sheath in a magnetic field [ J]. Vacuum, 2004, 73: 681-685.
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