CVD金刚石膜/硅为基板的微条气体室性能研究

Performance of micro-strip gas chamber fabricated on the CVD diamond film/Si composite substrate

提出了一种新型的CVD金刚石膜/硅(ρ～1010Ω·cm)为基板的微条气体室,阳极宽度7μm阴极100μm,间距200μm。室温下,充以1.01×10-5PaAr+CH4混合气体时,采用5.9keV55FeX射线测量了探测器在不同高压和气体比例时的脉冲高度分布,详细讨论了高压和气体比例对能量分辨率的影响,结果表明该探测器具有较高的信噪比和能量分辨率。在Ar+10%CH4混合气体、-1100V漂移电压和-650V阴极电压工作条件下,微条气体室能量分辨率可达12.2%。

A novel Micro -Strip Gas Chamber (MSGC) was fabricated on the CVD diamond film/Si composite substrate, with anode width of 7 μm, cathode width of 100 μm and pitch of 200 μm. At room temperature and 1.01 × 105 Pa, 5.9 keV X-rays from a 55Fe source were used to measure the pulse height distributions of the MSGC operating at different high voltages and Ar+CH4 gas proportions. The results show that MSGC has a high ratio of signal to noise. The energy resolution depending on high voltage and gas proportion was discussed in detail. On the optimum condition of Ar+10% CH4 gas mixture, -1100 V drift potential and -650 V cathode voltage, a better energy resolution of 12.2% is achieved.