低温下水汽在Si(111)7×7表面上的化学吸附

CHEMISORPTION OF H_2O ON Si(111)7×7 SURFACE AT LOW TEMPERATURES

用ELS和XPS研究了低温下水汽在Si(111)7×7表面上的化学吸附及其随退火温度的变化。150K低温下水以解离形式吸附在Si(111)7×7表面。

The chemisorption of water vapor on Si(III)7 × 7 surface at low temperatures and the effect of annealing were studied, with X-ray photoelectron spectroscopy and energy loss spectroscopy. It was found that the water molecules taken up on the Si(III)7×7 surface were dissociative at 150 K.