摘要
利用Raman和XPS研究N离子注入前后非晶碳膜化学键合的变化及CN成键情况. 结果表明, 被注入到非晶碳膜内的N与C原子结合, 形成sp3 CN, sp2 CN和C≡N键. 随着N离子注入剂量的增加, 膜内sp3 CN键的含量相对增多, 表明N离子注入更有利于sp3CN键的形成.
N-implantation into amorphous carbon films with different doses was carried out to study the formation of CN bonding. Raman and XPS spectra were used to characterize the chemical bonding of CN bonds in amorphous carbon films after N-implantation. The results show that N atoms implanted into amorphous carbon films are bound to C atoms by different bonding types of sp 3 CN, sp 2 CN and C≡N in the films. When N-implantation dose increases, the relative content of sp 3 CN bonds increases, which is more than those of other types of CN bonds in the films. It indicates that N-implantation is favorable to the formation of sp 3 CN bonds.
出处
《吉林大学学报(理学版)》
CAS
CSCD
北大核心
2005年第3期324-327,共4页
Journal of Jilin University:Science Edition
基金
国家 863项目基金(批准号: 50372024)
关键词
N离子注入
非晶碳膜
磁控溅射
键合结构
N-implantation
amorphous carbon film
magnetron sputtering
chemical bonding structure