基片偏压对MCECR溅射硬碳膜特性的影响

Influence of Substrate Bias on the Properties of Hard Carbon Films Prepared by MCECR Sputtering

采用封闭式电子回旋共振(MCECR)氩等离子体溅射碳靶的方法在硅片上沉积了高质量的硬碳膜,膜层厚度约40nm. 使用X射线光电子能谱仪(XPS)和高分辨率透射电子显微镜(HRTEM)分析了碳膜结构,并用POD摩擦磨损仪测试了碳膜的摩擦磨损特性,用纳米压入仪测试了碳膜的纳米硬度.详细研究了基片偏压对碳膜的结构、摩擦磨损特性以及纳米硬度的影响,得到了最佳基片偏压.

The carbon films exhibit a variety of useful properties such as a hardness approaching that of a diamond, transparency, a smooth surface morphology, wear resistance and chemical inertness, and were widely applied in the fields of mechanics, electronics, optics, and magnetic, and so on. Experimental studies to obtain high quality hard carbon films were conducted using a Mirror-Confinement-type Electron Cyclotron Resonance (MCECR) plasma sputtering method. The carbon films with 40 nm thickness were deposited on Si by sputtering the carbon target with Ar+. The structure of carbon films was analyzed using the X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM), the tribological properties were measured using the Pin-on-Disk tribometer, and the nanohardness was measured using the nanoindenter. The effect of substrate bias on the structure, tribological properties, and nanohardness of carbon film was studied in detail, and the best substrate bias was obtained.