期刊文献+

CoSi_2薄膜二维X射线衍射线形分析与表征 被引量:2

ANALYSIS AND CHARACTERIZATION OF 2-D X-RAY DIFFRACTION PROFILE FOR CoSi_2 FILM
下载PDF
导出
摘要 利用二维X射线衍射线形分析方法,分析了CoSi2薄膜材料的二维衍射线形.结果表明,薄膜中不同方位的衍射线形存在明显差异,主要与材料中晶粒尺寸及显微畸变的空间分布有关,其中沿薄膜法线方向上的晶粒尺寸最大,同时该方向的显微畸变最小. The profile analysis method of 2-D X-ray diffraction was used to analyze the COSi2 film. The results show that there are evident difference between diffraction profiles from different directions of the film, which relates mainly to the space distributions of the grain size and the micro-distortion in film materials. Along the normal direction of film, the materials exhibit the maximum grain size and the minimum micro-distortion.
出处 《金属学报》 SCIE EI CAS CSCD 北大核心 2005年第5期487-490,共4页 Acta Metallurgica Sinica
基金 国家自然科学基金50131030上海AM基金项目0211资助
关键词 CoSi2薄膜材料 二维X射线衍射 线形分析 CoSi2 film two-dimensional X-ray diffraction profile analysis
  • 相关文献

参考文献1

同被引文献19

  • 1洪波,姜传海,王新建,吴建生.Ni-P非晶薄膜晶化相与相变动力学的XRD分析[J].金属学报,2006,42(7):699-702. 被引量:13
  • 2王俊忠,吉元,王晓冬,刘志民,罗俊锋,李志国.Al互连线和Cu互连线的显微结构[J].物理学报,2007,56(1):371-375. 被引量:6
  • 3谈国太,陈正豪.La_(1-x)Te_xMnO_3晶格结构的X射线粉末衍射分析[J].物理学报,2007,56(3):1702-1706. 被引量:5
  • 4LIB Z, SULLIVAN T D, LEE T C, et al. Reliability challenges for copper interconnects [J]. Microelectronics Reliability, 2004,44: 365-380.
  • 5RYU C. Microstructure and reliability of copper interconnects[J]. IEEE Transaction on Electron Devices, 1999,46(6):1113-1120.
  • 6BIMBAULT L, BADAWI K F, GOUDEAU P, et al. Profile analysis of thin film X-ray diffraction peaks [J]. Thin Solid Films, 1996,275 : 40-43.
  • 7DJERDJ I, TONEJC A M, TONEJC A, et al. XRD line profile analysis of tungsten thin films[J]. Vacuum, 2005,80: 151-158.
  • 8SHAN F L,GAO Z M,WANG Y M. Microhardness evaluation of Cu-Ni multilayered films by X-ray diffraction line profile analysis[J]. Thin Solid Films, 1998,324:162-164.
  • 9GHOSH J, CHATTOPADHAYAY S K, MEIKAP A K,et al. Microstructure characterization of titanium-base aluminium alloys by X-ray diffraction using Warren-Averbaeh and Rietveld method[J]. Journal of Alloys and Compounds, 2008,453 : 131-137.
  • 10CHAKRABORTY J, KISHOR KUMAR K, MUKHERJEE S, et al. Stress, texture and microstructure of zirconium thin films probed by X-ray diffraction[J]. Thin Solid Films, 2008, 516: 8479- 8486.

引证文献2

二级引证文献21

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部