摘要
以硝酸铟和四氯化锡为源材料,无水乙醇和乙酰丙酮为溶剂,采用溶胶—凝胶工艺制备出纳米晶ITO透明导电薄膜.采用XRD和SEM分析了薄膜的物相和显微形貌,采用面电阻测量仪和分光光度计测量了薄膜的方阻和可见光透过率.实验结果表明,随着热处理温度升高,晶化程度提高,组织逐渐均匀致密,晶粒长大,700℃热处理时薄膜晶化趋于完善.同时,方阻减小而可见光透过率增加.经过700℃热处理、厚度为400nm的ITO膜的方阻约300Ω/□,可见光透过率>80%.
The transparent conductive ITO thin films with less than 400 Ω/□ of the sheet resistance and more than 80% of the visible transmittance were prepared by a sol-gel process. The microstructure and phase of the films were analyzed by XRD and SEM.The sheet resistance and optical transmittance of the films were measured by using the four-point probe method and spectrophotometer.The experiment results demonstrate that the microstructure of the films homogenizes and crystallizes,the grains of the film is growth gradually,and the sheet resistance and optical transmittance of the films are also decrease with increasing of the temperature.On the other hand,the sheet resistance and optical transmittance of the films are decrease with increasing of the thickness of the film.
出处
《西安工业学院学报》
2005年第1期52-55,60,共5页
Journal of Xi'an Institute of Technology
基金
陕西省教育厅专项基金 (0 3JK1 47)
