基于Marangoni界面效应的数控化学抛光去除函数的研究

Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect

利用基于Marangoni界面效应对化学抛光去除函数的理论及实验进行研究,提出采用湿法化学抛光(刻蚀)方法为大口径高精度光学元件的加工提供新的解决途径。介绍了Marangoni界面效应及其验证实验,运用WYKO轮廓仪对熔石英基片局域刻蚀前后的粗糙度进行检测,结果表明,粗糙度基本无变化,刻蚀前后粗糙度分别为0. 72nm和0. 71nm。基于Preston假设, 建立了数控化学抛光理论模型,运用WYKO干涉仪观察实验现象可知,化学抛光刻蚀曲线基本上成平底陡峭的去除函数曲线,小磨头抛光是倒置的仿高斯函数曲线。

Based on the Marangoni interface effect, the theory and test of the removal function of numerically controlled chemical polishing are studied. Wet etching of optics surface is adopted in large optical components manufacture. Before the optical components test, the roughness of the optical components, measured by WKYO apparatus, is 0.72 nm; after the test, the roughness is 0.71 nm. Based on the Preston supposition, the theory and the removal function of numerically controlled chemical polishing are setup. The removal function curve of small tool polishing is Gauss-like.