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磁控溅射氮化钛/氮化铝纳米多层膜的抗磨性能及其在金属加工刀具中的应用研究 被引量:10

Study of the Wear-Resistance and Machining Application of Magnetron Sputtered TiN/AlN Nano-Multilayer Films
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摘要 采用新型高速反应真空磁控溅射系统制备了氮化钛/氮化铝纳米多层膜,探讨了周期(λ)对多层膜力学性能及抗磨性能的影响;在微钻针及车刀表面分别制备了上述多层膜,并分别对电路板以及中碳钢棒进行实机加工测试,以验证其实用性.结果表明:通过控制溅射参数可以制备出周期范围为2.4~67.6nm的氮化钛/氮化铝多层膜;当周期λ≤3.6nm时,相应的多层膜具有较高的硬度、良好的粘附性能及优异的抗磨性能.实机测试结果显示,所制备的多层膜可以改善金属车削和微钻削加工条件,改善程度优于单层氮化钛镀膜. TiN/AlN nano-multilayer films were prepared on single crystal silicon wafer and high-speed steel using a new sputtering setup designed and manufactured based on high-rate reactive magnetron sputtering. Thus a group of TiN/AlN nano-multilayer films with various periods were prepared by properly controlling the deposition conditions, and the influence of the deposition parameters, especially the N_2 flux and periods on the hardness, thickness, composition, and wear resistance of the multilayers was investigated. Moreover, the multilayers were also sputtered on micro-drills and turning cutters as the antiwear coatings. And their effectiveness in increasing the wear-resistance of the drilling and cutting tools in machining circuit board and medium carbon steel bar, respectively, was examined so as to explore their feasibility in actual machining. The results revealed that the TiN/AlN nano-multilayer films with periods of 2.4~67.6 nm were obtained by properly controlling the deposition parameters. The sputtered multilayers of periods≤3.6 nm had extremely high hardness, good bongding strength to the substrate, and excellent wear-resistance. The field test confirmed that the TiN/AlN nano-multilayer was superior to traditional single-layer TiN film in terms of the ability to increase the wear-resistance of the machining tools in actual machining process.
出处 《摩擦学学报》 EI CAS CSCD 北大核心 2005年第3期258-264,共7页 Tribology
基金 台湾省科学委员会资助项目(NSC92-2212-E-309-001).
关键词 氮化钛/氮化铝纳米多层膜 周期 耐磨性 车削 微钻削 TiN/AlN nano-multilayer films period wear-resistance turning micro-drilling
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  • 1Holmberg K, Ronkainen H, Matthews A. Tribology of thin coatings[J]. Ceram Int, 2000, 26 (7): 787-795.
  • 2Setoyama M, Nakayama A, Tanaka M, et al. Formation of cubic-AlN in TiN/AlN superlattice[J]. Surf Coat Technol, 1996, 86-87: 225-230.
  • 3Jensen H, Sobata J, Sorensen G. Multilayer film deposition of TiN/AlN on a rotating substrate holder from reactive sputtering of elemental targets of titanium and aluminum[J]. J Vac Sci Technol A, 1997, 15: 941-945.
  • 4Sundgren J E. Structure and properties of TiN coatings[J]. Thin Solid Films, 1985, 128 (1/2): 21-44.
  • 5Inoue S, Uchida H, Yoshinaga Y, et al. Oxidation behavior of (Ti1-xAlx)N Films prepared by r.f. reactive sputtering[J]. Thin Solid Films, 1997, 300: 171-175.
  • 6张增志,张利梅,白兵占,李文龙.聚晶立方氮化硼刀具切削高锰钢的磨损机制[J].摩擦学学报,2004,24(3):202-206. 被引量:11
  • 7白清顺,姚英学,BEX Phillip,ZHANG Grace.聚晶金刚石刀具加工强化复合地板时的切削性能及磨损机理研究[J].摩擦学学报,2003,23(2):81-85. 被引量:6
  • 8Su Y L, Yao S H, Wu C T. Comparisons of characterizations and tribological performance of TiN and CrN deposited by cathodic arc plasma deposition process[J]. Wear, 1996, 199: 132-141.
  • 9Kim D G, Seong T Y, Baik Y J. Effects of annealing on the microstructures and mechanical properties of TiN/AlN nano-multilayer films prepared by ion-beam assisted deposition[J]. Surf Coat Technol, 2002, 153: 79-83.
  • 10Pandey R, Sutjianto A, Seel M, et al. Electronic structure of high pressure phase of AlN[J]. J Mater Res, 1993, 8 (8): 1 922-1 927.

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