摘要
采用新型高速反应真空磁控溅射系统制备了氮化钛/氮化铝纳米多层膜,探讨了周期(λ)对多层膜力学性能及抗磨性能的影响;在微钻针及车刀表面分别制备了上述多层膜,并分别对电路板以及中碳钢棒进行实机加工测试,以验证其实用性.结果表明:通过控制溅射参数可以制备出周期范围为2.4~67.6nm的氮化钛/氮化铝多层膜;当周期λ≤3.6nm时,相应的多层膜具有较高的硬度、良好的粘附性能及优异的抗磨性能.实机测试结果显示,所制备的多层膜可以改善金属车削和微钻削加工条件,改善程度优于单层氮化钛镀膜.
TiN/AlN nano-multilayer films were prepared on single crystal silicon wafer and high-speed steel using a new sputtering setup designed and manufactured based on high-rate reactive magnetron sputtering. Thus a group of TiN/AlN nano-multilayer films with various periods were prepared by properly controlling the deposition conditions, and the influence of the deposition parameters, especially the N_2 flux and periods on the hardness, thickness, composition, and wear resistance of the multilayers was investigated. Moreover, the multilayers were also sputtered on micro-drills and turning cutters as the antiwear coatings. And their effectiveness in increasing the wear-resistance of the drilling and cutting tools in machining circuit board and medium carbon steel bar, respectively, was examined so as to explore their feasibility in actual machining. The results revealed that the TiN/AlN nano-multilayer films with periods of 2.4~67.6 nm were obtained by properly controlling the deposition parameters. The sputtered multilayers of periods≤3.6 nm had extremely high hardness, good bongding strength to the substrate, and excellent wear-resistance. The field test confirmed that the TiN/AlN nano-multilayer was superior to traditional single-layer TiN film in terms of the ability to increase the wear-resistance of the machining tools in actual machining process.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
2005年第3期258-264,共7页
Tribology
基金
台湾省科学委员会资助项目(NSC92-2212-E-309-001).