摘要
叙述一种新型衍射光学元件──—二元光学元件的设计原理及其制造方法。分析二元光学元件的衍射效率和色差，讨论光刻法对其最小特征线宽的限制因素，阐明二无光学元件的特点及应用。
The design principle of a new diffraction optical element and its manufacturing method (photoetching and film deposition) are described,The diffraction efficiency and chromatic aberration of the binary optical element are analyzed, and limitation factors of photolithography on element minium characteristic line width discussed, and. the feature of binary optical element and its application illuminated.
出处
《应用光学》
CAS
CSCD
1994年第1期11-14,共4页
Journal of Applied Optics
关键词
二元
光学元件
透镜
衍射
色差
binary optical element, lens, diffraction, chromatic aberration, mask
