摘要
It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
基金
This work was supported by the National Natural Science Foundation of China(No.50071017)
the National High-Tech Program of China(No.2002A A302507).
