光刻工艺中缺陷来源的分析

Analysis on Defect Sources in Photolithographic Process

针对半导体集成电路和器件的制作过程中,在光刻工艺过程中各种缺陷产生的种类及来源进行了基本的集中性分析,提出了一些减少或消除这些缺陷的办法和措施。

According to the fabrication process of semiconductor IC and devices, the sorts and sources of the different defect generation in photolithographic process are integrally analyzed, and the measures to reduce or eliminate these defects are proposed.