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化学增感对光电子时间分辨谱的影响

Effects of Chemical Sensitization on Photoelectron Time-Resolved Spectrum
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摘要 利用微波吸收相敏检测技术,对AgBrI T颗粒乳剂中光电子时间行为进行了检测,并获得了自由光电子与浅束缚光电子的时间分辨谱。实验结果表明,在加入Na2 S2 O3相同的条件下S与S +Au增感中心所起的电子陷阱作用不同,S增感中心所起的作用为深电子陷阱,增感中心由于增加了对光电子的深束缚,从而造成自由光电子与浅束缚光电子的衰减加剧;S +Au增感中心所起的作用为浅电子陷阱,增感中心通过暂时束缚光电子有效降低了光电子与光空穴的复合,减缓了自由光电子与浅束缚光电子的衰减,可见加入KAuCl4 后形成的S +Au增感中心陷阱深度要比S增感中心的陷阱深度浅。从光电子时间分辨谱的变化可以看出S与S +Au增感中心在衰减曲线的不同时域中对光电子衰减的作用表现不同。 The time-resolved spectra of free photoelectrons and shallow-trapped electrons in the T-grains AgBrI emulsion were simultaneously detected with microwave absorption and dielectric spectrum detection technique. The results indicate that the electron trap effects of sulfur sensitization centers and sulfur-plus-gold sensitization centers are different with equal quantities of Na2S2O3 added. The sulfur sensitization centers acted as a deep electron trap to pick up the electronic decay because of increasing the number of deep trapped electrons, while the sulfur-plus-gold sensitization centers as a shallow electron trap decrease the electronic decay through effectively controlling the recombination between the electrons and the holes. The depth of sulfur-plus-gold sensitization center is shallower than that of sulfur sensitization center after the KAuCl4 is added. The effects of sulfur sensitization center and sulfur-plus-gold sensitization center on the photoelectron decay are different in different sections of decay curves through the change in electron time-resolved spectra.
出处 《光谱学与光谱分析》 SCIE EI CAS CSCD 北大核心 2005年第6期815-818,共4页 Spectroscopy and Spectral Analysis
基金 国家自然科学基金(10274017) 河北省自然科学基金(103097)资助项目
关键词 增感 电子陷阱 光电子 时间分辨谱 sensitization electron trap photoelectron time-resolved spectrum
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  • 1PENGBi-xian CUIWei-dong etal(彭必先 崔卫东 ).J. Gradu. Sch. Acad. Sin.(中国科学院研究生院学报),1997,14(2):131-131.
  • 2WANGWei PENGYan-bin etal(王巍 彭彦彬 ).Photographic Material(感光材料),1996,4:8-8.
  • 3Marchetti A P, Collier S S, Crews N P. Photographic Science and Engineering, 1984, 28(4): 146.
  • 4Kawasaki M, Hada H. J. Imaging Sci., 1990, 34(5): 161.
  • 5Farnell G C, Solman L R. J. Photographic Science, 1976, 24: 203.
  • 6Hada H, Kawasaki M. J. Imaging Sci., 1985, 29: 51.
  • 7Faelens P. J. Photographic Science, 1978, 26: 144.
  • 8Kaneda T. J. Imaging Sci., 1989, 33(4): 115.
  • 9Yang Shaopeng, Li Xiaowei, Han Li, et al. Chin. Phys. Lett., 2002, 19(3): 429.
  • 10Mussing Th, Hegenbart G. J. Imaging Sci. Tech., 1994, 38(6): 526.

二级参考文献9

  • 1Hamilton J F.Adv.Phys.,1988,27 (4):359.
  • 2Hamilton J F.The Theory of the Photographic Process.ed.James T H.New York:Macmillan,1977.Chapter Ⅰ and Ⅱ.
  • 3Ohwaki T,Hirano A.Autumn Meeting of the Society of Photographic Science and Technology of Japan.1995.29.
  • 4EachusRS,BaetzoldRCet al.Phys.Rev.B,1999,59(13):8560.
  • 5DAI Hui,LIANG Bing,ZHUANG Si-yong et al(戴晖,梁冰,庄思永等)Photographic Science and Photochemistry(感光科学与光化学),2001,19(4):262.
  • 6YANG Shao-peng,Li Xiao-wei,HAN Li et al(杨少鹏,李晓苇,韩理等).Chin.Phys.Lett(中国物理快报),2002,19(3):429.
  • 7Li Xiao-wei,HUXiao-yong(李晓苇,胡小永).J.InformationRecordingMaterial(信息记录材料),2001,2(2):36.
  • 8Müssig Th.J.Imaging Sci.Tech.,1997,41(2):118.
  • 9Müssig Th,RussowAet al.J.Imaging Sci.Tech.,1994,38(6):526.

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