摘要
Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.
Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.
基金
This work was supported by the National Natural Sci- ence Foundation of China (No. 10435050, 60378021)
by the Nanometer Technology Special Founda- tion of Shanghai Science and Technology Commit- tee (No. 0352nm090).
