期刊文献+

热处理工艺对合金薄膜电阻及其稳定性的影响 被引量:3

Effects of heat treatment process on alloy thin film resistance and its stability
下载PDF
导出
摘要 利用离子束溅射镀膜技术,在17-4PH不锈钢弹性衬底上直接溅射SiO2绝缘膜和NiCr薄膜,制备了一种新型的压力传感器用合金薄膜。分析了热处理工艺对合金薄膜电阻稳定性的影响,对NiCr薄膜电阻进行了4种热处理工艺,获得了使合金薄膜电阻长期稳定的热处理工艺参数在SiOx和N2的保护下,673K退火1h,并在473K下保温24h。用该工艺能制备适应各种恶劣环境的高精度压力传感器。 Alloy thin film for advanced pressure sensors is manufactured by means of ion-beam sputtering SiO_2 insulation film and NiCr thin film on the 17-4PH stainless steel elastic substrate.The effects on stability of thin film alloy resistance are thoroughly analyzed.The NiCr thin film resistance is respectively heat-treated by four processes,and paramaters of heat treatment that make thin film resistance stable are obtained.The thin film resistance is heat-treated under protection of SiO_x and N_2 at 673K for 1h,then it is kept at 473K for 24h.Pressure sensors of high precision for harsh environments can be manufactured by this process.
出处 《传感器技术》 CSCD 北大核心 2005年第7期27-28,31,共3页 Journal of Transducer Technology
基金 国家自然科学基金资助项目(69971007 69890227)
关键词 薄膜合金电阻 压力传感器 热处理 稳定性 thin film alloy resistance pressure sensors heat treatment stability
  • 相关文献

参考文献4

  • 1吕惠民,田敬民.压力传感器的研究现状与发展趋势[J].半导体技术,1998,23(2):11-13. 被引量:9
  • 2Lei J F,Martin L C,Will H A.Advances in thin film sensor technologies for engine applications [R].NASATM-107418,Orlando: ASME,International Gas Turbine and Aeroengine Congress and Exhibition,1997.
  • 3Wrbanek J D,Fralick G C,Martin L C,et al.A thin film multifunction sensor for harsh environments [R].NASA/TM-2001-211075,Cleveland:National Aeronautics and Space Administration,2001.
  • 4Chelner H.Embedded sensor technology for solid rocket health monitoring[R].MR-02-221,Simi Valley: Micron Instruments,2002.

二级参考文献2

共引文献8

同被引文献11

引证文献3

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部