采用MCECR等离子体溅射方法制备硬碳膜

Preparation of hard carbon films by MCECR plasma sputtering method

采用封闭式电子回旋共振(M CECR)等离子体溅射的方法在硅(100)基片上沉积了高质量的硬碳纳米微晶薄膜,膜层厚度约40 nm,采用氩等离子体溅射碳靶。薄膜的键结构采用X射线光电子能谱仪(XPS)分析,纳米结构采用高分辨率透射电子显微镜(HRTEM)分析。本文研究了基片偏压对薄膜的纳米结构、摩擦特性(摩擦系数及磨损率)以及薄膜的纳米硬度的影响。摩擦特性采用POD摩擦磨损仪测试,纳米硬度采用纳米压入仪测试。

Experimental studies to obtain high quality hard carbon nanocrystallite films were conducted by the Mirror-Confinement-type Electron Cyclotron Resonance (MCECR) plasma sputtering method. The 40nm-thick films were deposited onto silicon (100) substrates by sputtering the sintered carbon target with argon plasma. The linkage structure of the film was analyzed by the x-ray photoelectron spectropscopy (XPS) and the nanostructure was evaluated with the high-resolution transmission electron microscopy (HRTEM). The effect of argon ion irradiation energy controlled by the substrate bias on the nanostructure, tribological properties (friction coefficient, wear rate) and nanohardness of the film were investigated. The tribological properties were measured by a Pin-on-Disk tribometer, with the nanohardness of the films measured by a (nanoindenter.)