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化学气相沉积制备MoSi_2涂层分析 被引量:1

Analysis on the CVD Processes for MoSi_2 Coatings
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摘要 主要介绍了目前化学气相沉积(CVD)制备 MoSi_2涂层或薄膜的几种方法,从反应原理和沉积产物结构等方面分析了各种方法的特点,提出了这些方法在制备 MoSi_2涂层过程中所存在的问题,并讨论了 CVD 制备 MoSi_2涂层应用于碳/碳复合材料高温抗氧化保护的可行性。 Several methods of depositing moSi_2 coatings or thin films by chemical vapor deposition are re- viewed in this article.By introducing the reaction mechanisms and the microstructures of the deposited coatings or thin films,the characteristics of these methods and the current problems are summarized.At the same time.the feasibility of depositing MoSi_2 coatings by CVD serviced on the high temperature protection for carbon/carbon composites is ana- lyzed.
出处 《材料导报》 EI CAS CSCD 北大核心 2005年第7期37-40,共4页 Materials Reports
基金 国家杰出青年基金(50225210) 航空基础科学基金(03H53044)
关键词 MoSi2涂层 化学气相沉积 制备 碳/碳复合材料 高温抗氧化 产物结构 反应原理 CVD chemical vapor deposition(CVD) MoSi_2 coatings carbon/carbon composites
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参考文献24

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共引文献94

同被引文献16

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