电子束光刻和电子束抗蚀剂

Electron team lithography and electron beam resists.

文中介绍了电子束光刻的特点、原理,以及各种电子束抗蚀剂的研究和应用动向。

This paper describes the characteristics and principles of electron beam lithography, types of electron beam tesists and their trends m research and applications.