摘要
利用77K红外光致发光实验研究了电化学过程对离子注入Si:Er(3+)样品的光致发光影响.实验表明:电化学过程除在Si:Er(3+)样品硅基质晶体中引入大量的深能级局域态外,还使Si:Er(3+)样品中Er(3+)的1.54μm光致发光效率明显提高,且Er(3+)发光峰增宽,次峰更丰富.
The influence of electrochemical anodization on the Er3+ luminescence from Si:Er3+ samples fabricated by the ion implantation technique was studied by using the infrared photoluminescence experiment at 77K.The experiment suggested that there is a great number of localized deep levels formed in the silicon crystal of the St:Er3+ samples in the anodization process. It is significant that the 1.54pm emission of the Er3+from the Si:Er3+ samples is intensified efficiently by the addition of anodization into the sample-fabricating process. The Er3+-emitting peak of 1.54μm of the samples is also widened and there are rich companion peaks of the Er3+luminescence appearing in the PL spectra of the anodized samples.
出处
《红外与毫米波学报》
SCIE
EI
CAS
CSCD
北大核心
1995年第4期317-320,共4页
Journal of Infrared and Millimeter Waves
关键词
离子注入
铒3
阳极氧化
光致发光
深能级
ion-implantation,Er ̄(3+)emission,anodization,low-temperature photoluminescence,deep levels.