基片负偏压对PEMSIP法TiN涂层的影响

Influence of substrate negative bias on TiN coatings deposited by plasma enhanced magnetron sputter ion plating

应用Ｘ射线衍射分析研究了基片负偏压对ＰＥＭＳＩＰ法ＴｉＮ涂层相组成的影响；结果表明，随着基片负偏压增加，膜层相组成朝着富氮相及其含量增加的方向发展，进而影响膜层的硬度。通过微区化学成分分析（ＥＤＳ）研究了膜基界面附近的成分分布。结果表明，界面处有过渡层；偏压愈高，过渡层愈显著。

The influence of substrate negative bias on component phases of TiN coatingsdeposited by PEMSIP is investigated by means of X-ray diffraction analysis。The results showthat variation of component phases trends towards the formation of nidrides rich in nitrogen andthe increase of its content with the increase of the substrate negative bias.The effect of thesubstrate negative bias on the microhardness is mainly caused by that the substrate negative biaseffects the component phase of the coatings;The element distribution of the interface of coating/substrate is also investigated by EDS analysis,The resuIts indicate that there exists a transitionlayer in the interface between the coating and the substrate. The higher the substrate negativebias,the more obvious the transition layer.