摘要
应用X射线衍射分析研究了基片负偏压对PEMSIP法TiN涂层相组成的影响;结果表明,随着基片负偏压增加,膜层相组成朝着富氮相及其含量增加的方向发展,进而影响膜层的硬度。通过微区化学成分分析(EDS)研究了膜基界面附近的成分分布。结果表明,界面处有过渡层;偏压愈高,过渡层愈显著。
The influence of substrate negative bias on component phases of TiN coatingsdeposited by PEMSIP is investigated by means of X-ray diffraction analysis。The results showthat variation of component phases trends towards the formation of nidrides rich in nitrogen andthe increase of its content with the increase of the substrate negative bias.The effect of thesubstrate negative bias on the microhardness is mainly caused by that the substrate negative biaseffects the component phase of the coatings;The element distribution of the interface of coating/substrate is also investigated by EDS analysis,The resuIts indicate that there exists a transitionlayer in the interface between the coating and the substrate. The higher the substrate negativebias,the more obvious the transition layer.
出处
《大连理工大学学报》
EI
CAS
CSCD
北大核心
1995年第3期339-343,共5页
Journal of Dalian University of Technology
基金
三束材料改性国家重点实验室资助项目
关键词
等离子体
氮化钛
磁控溅射
涂层
离子镀
plasma
modification
titanium nitride/magnetron sputtering
transition layer