摘要
研究了用于射频溅射ＰＴＣ－ＢａＴｉＯ_３薄膜的厚大靶材制备工艺，所制成的靶材的室温电阻率为８００Ω·ｃｍ，ＰＴＣ效应＞１０５，平均粒径为１～３μｍ，讨论了配方中ＴｉＯ_２品种的选择。
The preparation technology of a thick and large PTC-BaTiO3 target to be used as a source of rf-sputtering identical composition films is studied. The target has a resistivity (atroom temperature) of 800Ω·cm and its PTC effect is greater than 105. The diameter of the crystal grains has the mean value of 1～μm. The influences of the selection of the variety of TiO2, the proportions of the donors and the acceptors in the prescription, the rates of heating and cooling during sintering of the PTC effect are discussed.
出处
《材料科学与工艺》
EI
CAS
CSCD
北大核心
1995年第4期44-47,共4页
Materials Science and Technology
