摘要
本文给出Venkatesh-Kitchen边缘检测性能度量的一种修正形式.由于用双边缘评价模型代替了原来的单边缘模型,新度量能够计及相邻边缘通过平滑互相影响而引起的边缘定位误差.
Presented here is a performance measure for edge detectors which is a modification of the Venkatesh-Kitchen measure. By replacing the original single VES (vertical edge segment) testing model with a two VES one, the new measure takes into account edge localization errors due to interference of neightoring edges through image smoothing.
出处
《模式识别与人工智能》
EI
CSCD
北大核心
1995年第A01期157-160,共4页
Pattern Recognition and Artificial Intelligence
基金
国家教委博士基金
关键词
边缘检测
性能度量
图像处理
Edge Detection, Edge Displacement, Single VES Model, Two VES Model.
