摘要
本文在总结实验的基础上,给出了化学腐蚀的选择原则。并针对化学腐蚀中较重要的晶向择优和异质择优腐蚀,借助大量的曲线和照片,就 GaAs、GaAlAs材料做了讨论。最后,简单介绍了一下它们的应用。
Based on experiments,first,the selection principles of etchings are given.And then,by the aid of urves and photographs,the crystal orientation selective etching and the hetero selective etching of GaAs and AlGaAs materials as a more important part of chemical etcnings are discussed.Finally,the main app- lications of selective etchings are briefly presented.
出处
《半导体光电》
CAS
CSCD
北大核心
1989年第4期31-35,15,共6页
Semiconductor Optoelectronics
基金
国家自然科学基金6866022