强化垂直聚焦剖面法的异常特征

Anomaly Characteristics of Strengthened Vertically Focused Electric Profiling

本文以理论计算结果,指出了球体上强化垂直聚焦法的ρ_s剖面曲线的异常规律,并与一般垂直聚焦剖面法和三极剖面法在低、高阻球体主剖面上的视电阻率ρ_s异常特征作了比较。文中还给出了水槽模型实验结果,使理论计算得到的异常规律得到证实。

In the light of theoretical computation and model experiments some characteristics of anomaly curves due to a conducting sphe e in resistivity profiling with strengthened vertically focused array are shown in this paper, These curves were compared with those obtained by the common vertically fccused and pole-dipole arrays. It is concluded that the vertically focused profiling is unable, to increase its depth of investigation further to an extent higher than that of other profiling methods. In addition, it has a very low work efficiency in the field owing to the cumbersomeness of its electrode configuration.