用RF同轴磁控溅射技术制作c轴择优取向ZnO薄膜

ZnO Films with Preferential c-axis Orientation Prepared by RF Cylindrical Magnetron Sputtering

ZnO薄膜是一种性能优良的多功能电子材料,用途十分广泛。本文介绍了我所研制的RF同轴磁控溅射装置及成膜技术。用此设备已制作出c轴择优取向的ZnO薄膜,并经各种检测证明膜质优良。用这种技术溅射制作的ZnO薄膜彩电中频滤波器性能良好,完全满足器件要求。本装置制作的薄膜膜厚均匀区宽、膜质好,不仅适用于ZnO薄膜的小批量生产,也可用于溅射沉积其它各种介质膜和金属膜。

ZnO thin film is a multifunction electronic material with supeiior propeities and has found wide application.This paper presented a RF cylindrical magnetron sputtering equipment developed in our institute and the technique for sputtering films. The preferential c-axis orientation ZnO films were prepared by the equipment. The films were examined by variety of analysis methods, and they have excellent properties. The colour TV IF SAW filters used these films also have superior properties. This kind of sputtering equipment is not only suitable for mass production of ZnO films, but also for the sputtering deposition of other dielectric or metal films.