摘要
讨论了ＣＶＤ金刚石薄膜作为半导体材料的一些基本特性，主要叙述了金刚石薄膜的生长习性和结构特征对其电性能的影响，即其电导率的“尺度效应”和“晶面效应”，以及这些效应对由金刚石薄膜制备的半导体器件性能的影响。
The electrical characteristics of CVD diamond films as a new semiconductor material are discussed,as well as the effects of the crystalline habits and structrues of diamond films on electrical characteristics.The size effect,face effect of electrical conductivity of diamond films are also analysed as well as its effect on device performances.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
1995年第4期333-335,347,共4页
Semiconductor Optoelectronics
关键词
半导体材料
金刚石薄膜
结构
电导率
Semiconductor Material
Diamond Film
Structure
Electrical Conductivity
