VLSI中的Al金属化系统

Al Metallization System for VLSI

扼要介绍了Ａｌ在ＶＬＳＩ的作用及要求。指出了随着ＶＬＳＩ的发展，由Ａｌ金属化电迁徙引起的失效将成为影响ＶＬＳＩ可靠性的主要失效机理，并对由电迁徙引起的各种失效现象及相应的改进措施进行了分析。最后指出，随着Ａｌ金属化系统抗电迁徙性能的提高和新结构、新工艺的出现，Ａｌ在ＶＬＳＩ金属中的地位将会得到进一步的确认。

This paper gives a brief introduction to the action and requirements for Al in VLSI.It indicates that electromigration failure is the major failure mechanism with development of VLSI. Various failurephenomena due to elec-tromigration failure, and methods of innovation are analysed.Finally, the paper indicates that the role of Al in VISL will be confirmed further with improving the property of anti-electromigration of Al metallization system, and the emerging of new structures and new technics.