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甲酸盐型三价铬电镀液电化学研究 被引量:5

Electrochemical Study of Trivalent Chromium Plating Solutin Containing Formate
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摘要 研究了甲酸盐型三价铬镀液的电化学特性,通过循环伏安、动电位扫描、恒电位电镀、恒电流电镀证实了Cr^(3+)在电位负于—1.3V后开始还原为Cr,在-0.9V~-1.3V之间还原为Cr^(2+),Cr^(2+)是暂时的,在溶液中极不稳定.但能加速配体交换反应。讨论了Cr^(3+)电沉积的电极过程和镀层不能加厚的原因。 Electrochemical characteristics of trivalent chromium plating solution from formate was studied. By means of cyclic voltammogram,potentiodynamic polarization,potentiostatic electroplating and galvanostatic electroplating,it has testified that Cr3+reduce Cr after potential is more negative than-1. 3V;C3+reduce Cr2+when potential is be tween-0. 9^-1. 3V. Although Cr2+ is highly unsteady.it can accelerate ligand exchang processes. It has also been discussed for electrode processes of trivalent chromium electroplating and the reason for the plated film cannot be thickened.
出处 《表面技术》 EI CAS CSCD 1995年第4期17-20,共4页 Surface Technology
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  • 1屠振密,杨哲龙,汪沦海,韩晓明.三价铬电镀机理的研究——铬层不能增厚的原因[J]材料保护,1985(03).

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