射频溅射MoS_2、WS固体润滑膜在脂润滑下的摩擦学特性

STUDY ON TRIBOLOGICAL PROPERTIES OF R. F.SPUTTERED MOSZ AND WSZ THIN SOLID FILMLUBRICANT WITH GREASE

用球－盘试验机研究了射频溅射ＭｏＳ２，ＷＳ２固体润滑膜在脂润滑下的摩擦学特性，并用ＸＰＳ，ＳＥＭ和ＥＤＸ等方法进行了分析．结果指出，在锂基脂润滑下，表面溅射ＭＯＳ２薄膜后摩擦系数降低，擦伤载荷成几倍或几十倍增长，尤其在高滑动速度下效果更加明显，可在一定载荷范围内代替２＃主轴油进行润滑，摩擦中ＭＯＳ２膜表层组织很容易剥落，摩擦中与基体结合较牢的主要是表面下的有效膜厚。因而在本试验条件下两种厚度ＭＯＳ２膜的摩擦学性能基本无差别，溅射ＷＳ２膜中含氧量很高，且在整个膜层中均以ＷＯ３存在，因此减摩效果不理想。

In this paper, the tribological properties of R.F. sputtered MoS2 and WSZ thin solid film lubricant with grease 'were investigated on a ball-on-disc machine. The composition of films was analysed byXPS, SEM and EDX. The results show that the coefficient of friction decreases due to MoS2 film, and thecritical scuffing load with MoS2 film is several or several tens times of that without it under lubrication bylithium-base abase, especially at high sliding velocity. The lubricant of MoS2 film plus grease can substituteNo.2 spindle oil a certain load. The contribution to reducing friction is mode mainly by the effective layer ofMoS2 film, and its sudece laper is easily spalled in sliding. Therefore,the tribological properties of bothMoS2 film thicknesses are loss different under our testing condition.The friction-reducing propcrty ofsputtered WSZ film isn't obvious owing to the high oxygen content and WO3 present in all films.