摘要
利用SUPREM进行半导体集成电路工艺条件的萃取是工艺模拟的主要用途之一。本文介绍如何利用适当的算法进行工艺条件的自动萃取。在这篇论文里,介绍了预淀积工艺、离子注入工艺和氧化/再分布工艺的算法结构,并且讨论了算法的实现过程和算法实现环境。
It is one of main use of process simulation with SUPREM to gain semiconductor Ic process conditions,This paper will introduce how to gain automatically IC process conditions in the proper algorithm. In this paper,the algorithm of predeposition process and ion,implantation process and oxidation & distribution process is introduced,and the operation process and conditions of these algorithm are discussed.
出处
《电子器件》
CAS
1995年第3期201-206,共6页
Chinese Journal of Electron Devices