摘要
用直流反应磁控溅射法制备了氧化镍电致变色薄膜,采用XRD和TEM对所制的薄膜结构进行了研究。详细讨论了制腹工艺参数对氧化镍薄膜晶态结构的影响。
Nickel oxide thin films were deposited by de reactive magnetron spu tring.XRDand TEM were used to study the crystal structure of nickel oxide films,And the influence of techni-cal parameters on crystal structure ot nickel tilms were discussed.
出处
《电子器件》
CAS
1995年第3期184-190,共7页
Chinese Journal of Electron Devices