电子束曝光机自动套准系统的研究

Research of Auto-Alignment System for Electron Beam Lithography

本文描述了用于电子束曝光机的芯片自动套准系统，该系统包括：扫描控制器、图象采集子系统、相关位置计算单元和位置与角度修正子系统。利用该系统，完成一次双标记识别及修正的循环需时１１秒；角度最小修正值为０．０１４度；最终实现的套准精度达到３σ≤０．０７μｍ．

An auto-alignment system of the chip marks for the electron beam lithography is described.The system consists of the scanning controller,the gathering image subsystem,the calculation unit of the correlative position of the marks,and the correction subsystem of the position and angle.Using this system,the accomplishment aligninent of two marks takes about 11 seconds,the minimum corrected angle is 0.014 degree,and the achieved registration overlay accuracy is 3σ≤0.07μm.