电镀镍硼合金镀层结构与性能

Study on the Structure and Properties of Ni-B Alloy Electrodeposition

在电镀法制取镍硼合金研究的基础上，用Ｘ射线衍射方法对镍硼合金电沉积层的结构进行了测试和分析，并研究了镀层的性能．结果表明，电镀镍硼合金镀层在镇态下硼含量较低时为过饱和固溶体，随着硼含量的增加，由晶态向非晶态过渡，在３５０℃左右析出硼化物相．镀层有很高的硬度和较好的耐磨性，镀态硬度可达７００～８００ＨＶ，经过热处理后可超过１３００ＨＶ．此外，镀层有一定的耐酸性能和很强的耐碱液腐蚀的性能．这种合金作为功能性镀层具有广泛的应用前景．

XRD technique was used to analyze the structure and properties of the electrodeposition. The results showed that the electrodeposition is of oversaturated solid solution when depositing the alloy if boron content is low,and it transfers from crustal to amorphous with increasing boron content. The borides are precipatated at about 350℃. The deposit provides high hardness and wearablity,i. e. up to 700-800 HV even 1300 HV after heat treatment. In addition,the deposit is proved corrosion-resistant to a certain degree in acid solution and highly in basic solution. The Ni-B alloy,as a functional deposit,is in prospect of wide application.