摘要
阐述了金刚石薄膜涂层的性能及应用前景.用微波等离子体化学气相沉积方法在Si(111)以及SDA1003人造单晶金刚石的外露面上沉积出了优质金刚石薄膜层。
In this pepar the Properties and the application prospects of diamond film coatingwere described. And the excellent diamond film were deposited on Si (111) and SDAl00. manmadediamond with the method of microwave plasma chemical vapor desposition.
出处
《纺织高校基础科学学报》
CAS
1995年第2期142-148,共7页
Basic Sciences Journal of Textile Universities