期刊文献+

电化学现场X-射线衍射电解池及电极调节装置 被引量:1

In Situ X-Ray Diffraction Electrochemical Cell and Its , Electrode Adjust Device
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摘要 设计了一种能在常规粉末衍射仪上通用的电化学现场X-射线衍射测定的电解池及其电极调节装置,实现了电极表面与窗片之间液层厚度的连续可调,精度达±2μm。理论计算与实测结果均表明液层厚与衍射峰强度和峰位之间存在定量关系。 An in situ X-ray diffraction electrochemical cell and its electrode adjust device have been developed, which can be used on the conventional powder diffractometer. The thickness of the solution layer between the electrode surface and the window could be ad justed continuously in +2 um. The experiment and calculation have shown that the position and intensity of diffraction peak are quantitatively related to the thickness of the solution thin-layer.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 1995年第2期231-235,共5页 Chinese Journal of Analytical Chemistry
基金 厦门大学固体表面物理化学国家重点实验室的资助
关键词 X-射线衍射 电解池 电化学 电极 调节装置 Electrochemical cell, X-ray diffraction, thin-layer thickness
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二级参考文献5

  • 1陈昌国,重庆大学学报,1988年,11卷,8期,35页
  • 2刘永辉,电化学测试技术,1982年
  • 3陈昌国,分析仪器,1992年,3期,17页
  • 4涂云霞,重庆大学学报,1988年,11卷,8期,14页
  • 5李凤斌,中国科学.B,1986年,10期,1021页

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同被引文献15

  • 1冯春梁,马爱莲.不同电解质溶液对Ni腐蚀行为的影响[J].辽宁师范大学学报(自然科学版),2006,29(2):200-203. 被引量:3
  • 2查全性.电极过程动力学导论[M].北京:科学出版社,1987.231.
  • 3辜敏.电极/溶液界面的现场X-射线衍射研究[D].重庆:重庆大学,1993.
  • 4REAL S G,VILCHE J R,ARVIA A J.The characteristics of the potentiodynamic potential/current profiles obtained with the Ni/0.5N H2SO4[J].Corros Sci,1980,20:563-586.
  • 5BARBOSA M R,REAL S G,VILCHE J R,et al.Comparative potentiodynamic study of nickel in still and stirred sulfuric acid-ptassium sulfate solutions in the O.4-5.7 pH range[J].J.Electrochem.Soc.,1988,135(5):1077-1085.
  • 6REAL S G,BARBOSA M R,VILCHE J R,et al.Influence of chloride concentration on the active dissolution and passivation of nickel electrodes in acid sulfate solutions[J].J.Electrochem.Soc.,1990,137 (6):1696-1702.
  • 7BARBOSA M R,BASTOS J A,GARICA -JARENO J J,et al.Chloride role in the surface of nickel electrode[J].Electrochim.Acta,1998,44(5 -7):957-965.
  • 8DICKINSON T,POVEY A F,SHERWOOD M A.Dissolution and passivation of nickel[J].J.Chem.Soc.,1977,73:327-343.
  • 9BOCKRIS J.O' M.,REDDY A K N,RAO B.An ellipsometric determination of the mechanism of passivity of nickel[J].J.Electrochem.Soc.,1966,113:1133-1144.
  • 10CARBONIO R E,MACAGNOV A,GIORDANO M C,et al.Potentiodynamic response of the Ni(OH)2/NiOOH redox couple at the inner layer of the complex interface[J].J.Appl.Electrochem.,1982,12(1):121-126.

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