JD树脂刻蚀及涂层的XPS研究

Studies of Coating and Etching Process of JD Resin with XPS

ＪＤ光学树脂表面刻蚀过程的ＸＰＳ研究表明，引进树脂表面的ＣＯＮ、Ｃ＝Ｏ、Ｃ－ＳＯ３Ｈ、ＣＯＯＨ等基团随刻蚀温度的提高或时间的延长而增加，对其相对含量进行了计算。固化后的耐磨涂层具有ＳｉＯ２结构．ＪＤ板材的最佳刻蚀条件为２０℃、２０ｍｉｎ．

The etching process of JD resins studied with XPS shows that benzene rings accumulated on the surface more than in the body. The amount of groups such as C-OH,C=O,C-SO3H and COOH introduced into the surface during etching increased with the increase of temperature or the prolonging of the time,and the content of every groups is calculated. The abrasion-resistance coating after being solidified has SiO2 structure. The priority etching condition for JD resins is at 20℃ kept for 20 min,so that the adhesion strength of the coating is increased while the light transmittance of the substrate is not decreased obviously.